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Sputter sources

Bestec designs and provides different type of customized and ultra high vacuum (UHV) compatible magnetron sputter source assamblies to be integrated in a Bestec deposition system or as separate component.

Typical design parameters

  • Bakeable to at least 150°C.
  • Circular or rectangular target shapes possible.
  • Manual (in situ) source tilting.
  • Manual or pneumatic driven gas inlet valve at the source.
  • Integrated gas inlet at the head of the source (close to the target).


  • Integration of pneumatic of motor driven tilting is possible.
  • Integration of source tranlation is possible.
  • Combination of more than one source at a single flange.

Selected Projects