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P364 – 1″ UHV sputter deposition Kazan

Application

UHV sputter deposition system for thin film and multilayer deposition at 1″ substrates

Year of delivery

2012

Installation site

Kazan Federal University, Russia

Design Features

  • UHV magnetron sputter deposition system with combination of confocal and face to face sputter up configurations.
  • Up to eight 2″ magnetrons in confocal configuration and max. one 2″ magnetron in face to face configuration.
    • All magnetrons with manual in situ tilting.
    • All magnetrons with easy changeable magnetic system for use with ferromagentic or non-ferromagnetic target materials.
  • Partly motorized 2 axes sample manipulator with integrated motorized sample shutter, RF Bias potential otion and maximal sample temperature above 600°C.
  • Two motorized wedge shutters (oriented perpendicular to each other).
  • Thickness sensor setup for sputter rate check before deposition and deposition end point detection.
  • Integrated bake out system.

Special Features

  • System is prepared to be added to a cluster tool via transfer port at sputtering chamber.
  • Handling of typical 1″ analytic sample holders possible.

Outer Dimensions

Technical specifications and performance values

General

Sputtering chamber

Size

600 mm diameter, about 690 mm height

Material

stainless steel

Vacuum

Sputtering chamber

Base pressure

< 2 *10-9 mbar

Pump down time

1 hour to < 10-6 mbar

Chamber pumping

Turbo pumping stage, chamber lid differentially pumped by dry foreline pump

Bake out

< 150°C

Manipulator features

Sputtering chamber

Sample size

diameter max. 1″ substrate

Motion axes

manualmanipulator z translation

motorized (continous) sample stage rotation

two motorized wedge shutters (mounted at chamber system) with variable motion speed and user defined positioning

Temperatures

Room temperature (not stabilized) up to 600°C at sample

Special features

Use of samples with inplane as well as out of plane magnet assamblies is possible

Performance test results

Chamber pump down
Long time sample heating